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Nikhil Dole
Nikhil Dole
Senior Panel Process Engineer, Apple
Verifierad e-postadress på apple.com
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Technique to tune sidewall passivation deposition conformality for high aspect ratio cylinder etch
N Dole, EA Hudson, G Matamis
US Patent 10,170,324, 2019
582019
Technique to deposit sidewall passivation for high aspect ratio cylinder etch
EA Hudson, N Dole
US Patent 9,543,158, 2017
402017
Technique to deposit sidewall passivation for high aspect ratio cylinder etch
EA Hudson, N Dole
US Patent 10,297,459, 2019
272019
Fundamentals and applications of plasma cleaning
DPR Thanu, ES Srinadhu, M Zhao, NV Dole, M Keswani
Developments in surface contamination and cleaning: applications of cleaning …, 2019
172019
Pb Monolayer Mediated Thin Film Growth of Cu and Co: Exploring Different Concepts
D Wu, DJ Solanki, A Joi, Y Dordi, N Dole, D Litvnov, SR Brankovic
Journal of The Electrochemical Society 166 (1), D3013, 2018
132018
Electroless deposition of Pb monolayer: a new process and application to surface selective atomic layer deposition
D Wu, DJ Solanki, JL Ramirez, W Yang, A Joi, Y Dordi, N Dole, ...
Langmuir 34 (38), 11384-11394, 2018
112018
Reaction kinetics of metal deposition via surface limited redox replacement of underpotentially deposited monolayer studied by surface reflectivity and open circuit potential …
E Bulut, D Wu, N Dole, H Kilic, SR Brankovic
Journal of The Electrochemical Society 164 (4), D159, 2017
112017
Three or more states for achieving high aspect ratio dielectric etch
T Yanagawa, N Dole, R Bhowmick, E Hudson, FL Kozakevich, J Holland, ...
US Patent 10,504,744, 2019
82019
Underpotential and electroless Pb monolayer deposition on Ru (0001)
D Wu, K Ahmadi, N Dole, A Joi, Y Dordi, SR Brankovic
Journal of The Electrochemical Society 166 (10), D359, 2019
72019
Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques
DPR Thanu, ES Srinadhu, M Zhao, NV Dole, M Keswani
Elsevier, 2019
72019
Tuning surface chemoresistivity of au ultrathin films using metal deposition via surface-limited redox replacement of the underpotentially deposited Pb monolayer
K Ahmadi, D Wu, N Dole, OR Monteiro, SR Brankovic
ACS sensors 4 (9), 2442-2449, 2019
52019
Crack free Cr coatings from Cr3+ electrolyte
K Ahmadi, N Dole, O Karadavut, FCR Hernandez, TD Hall, EJ Taylor, ...
Journal of The Electrochemical Society 169 (1), 012504, 2022
42022
Electroless Pb Monolayer Deposition—Prelude for Further Advances in Catalyst Monolayer Synthesis via Surface Limited Redox Replacement Reaction
K Ahmadi, N Dole, D Wu, T Salavati-Fard, LC Grabow, ...
ACS Catalysis 11 (8), 4650-4659, 2021
42021
Method of achieving high selectivity for high aspect ratio dielectric etch
N Dole, T Yanagawa
US Patent 10,515,821, 2019
32019
Use of Surfactants in Acoustic Cleaning
DPR Thanu, A Antoniswamy, VV Swaminathan, ES Srinadhu, N Dole, ...
Surfactants in Precision Cleaning, 193-226, 2022
22022
Three or more states for achieving high aspect ratio dielectric etch
T Yanagawa, N Dole, R Bhowmick, E Hudson, FL Kozakevich, J Holland, ...
US Patent 10,861,708, 2020
22020
Strained Annealing of Cu Interconnects—The Novel Approach Towards Improving Resistance of Cu Nanostructures
N Dole, J Chawla, S Brankovic
TECHCON, BEOL Processing and Reliability, 2013
22013
Multiple State Pulsing for High Aspect Ratio Etch
JOI Aniruddha, N Dole, M Wong, E Hudson, J Sheth
US Patent App. 18/011,505, 2024
2024
Systems and methods for etching a high aspect ratio structure
N Dole, T Yanagawa, EA Hudson, M Wong, JOI Aniruddha
US Patent App. 18/011,837, 2024
2024
Corona Treatment of Polymer Surfaces to Enhance Adhesion
N Dole, K Ahmadi, D Solanki, V Swaminathan, V Keswani, M Keswani
Polymer Surface Modification to Enhance Adhesion: Techniques and …, 2024
2024
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