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Arnold Storm
Arnold Storm
TNO
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Title
Cited by
Cited by
Year
Fabrication of solid-state nanopores with single-nanometre precision
AJ Storm, JH Chen, XS Ling, HW Zandbergen, C Dekker
Nature materials 2 (8), 537-540, 2003
15992003
Fast DNA translocation through a solid-state nanopore
AJ Storm, C Storm, J Chen, H Zandbergen, JF Joanny, C Dekker
Nano letters 5 (7), 1193-1197, 2005
8942005
Insulating behavior for DNA molecules between nanoelectrodes at the 100 nm length scale
AJ Storm, J van Noort, S de Vries, C Dekker
Applied Physics Letters 79 (23), 3881-3883, 2001
6522001
Translocation of double-strand DNA through a silicon oxide nanopore
AJ Storm, JH Chen, HW Zandbergen, C Dekker
Physical review E 71 (5), 051903, 2005
5392005
Electron-beam-induced deformations of SiO2 nanostructures
AJ Storm, JH Chen, XS Ling, HW Zandbergen, C Dekker
Journal of Applied Physics 98 (1), 2005
962005
Lithographically fabricated nanopore-based electrodes for electrochemistry
SG Lemay, DM van den Broek, AJ Storm, D Krapf, RMM Smeets, ...
Analytical chemistry 77 (6), 1911-1915, 2005
582005
Nature Materials
AJ Storm, JH Chen, XS Ling, HW Zandbergen, C Dekker
London 2, 537, 2003
392003
Kinetics of Reduction of a RuO2(110) Film on Ru(0001) by H2
D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof
The Journal of Physical Chemistry C 116 (51), 26822-26828, 2012
292012
Generation and decomposition of volatile tin hydrides monitored by in situ quartz crystal microbalances
D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof
Chemical Physics Letters 552, 122-125, 2012
272012
Decomposition of SnH4 molecules on metal and metal–oxide surfaces
D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof
Applied Surface Science 288, 673-676, 2014
242014
Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor
DH Ehm, A Storm, JHJ Moors, BT Wolschrijn, T Stein, E te Sligte
US Patent 8,419,862, 2013
222013
Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
DH Ehm, A Van De Runstraat, BT Wolschrijn, AJ Storm, T Stein, ...
US Patent 7,959,310, 2011
192011
Particle cleaning of optical elements for microlithography
DH Ehm, AJ Storm, JHJ Moors, A Czap, M Nagel, JCJ Van der Donck, ...
US Patent 8,477,285, 2013
162013
Final Report on CCT-K1: Realizations of the ITS-90, 0.65 K to 24.5561 K, using rhodium–iron resistance thermometers
R Rusby, D Head, C Meyer, W Tew, O Tamura, KD Hill, M de Groot, ...
Metrologia 43 (1A), 03002-03002, 2006
142006
S. d. Vries and C
AJ Storm, J Noort
Dekker, Insulating behavior for DNA molecules between nanoelectrodes at the …, 2001
132001
Kinetics of reduction of a RuO2 (1 1 0) film on Ru (0 0 0 1) by atomic hydrogen
D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof
Microelectronic engineering 110, 60-65, 2013
122013
Quantification of the atomic hydrogen flux as a function of filament temperature and H2 flow rate
D Ugur, AJ Storm, R Verberk, JC Brouwer, WG Sloof
Journal of Vacuum Science & Technology A 30 (3), 2012
122012
Strategy for minimizing EUV optics contamination during exposure
N Harned, R Moors, M van Kampen, V Banine, J Huijbregtse, R Vanneer, ...
EUV Symposium, Sept 29, 2008
112008
Single-molecule experiments on DNA with novel silicon nanostructures.
AJ Storm
112004
Compatibility assessment of novel reticle absorber materials for use in EUV lithography systems.
J Stortelder, A Storm, V de Rooij-Lohmann, CC Wu, W van Schaik
Extreme Ultraviolet (EUV) Lithography X 10957, 259-267, 2019
92019
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