Origin of efficient oxygen reduction reaction on Pd monolayer supported on Pd-M (M= Ni, Fe) intermetallic alloy J Liu, CQ Sun, W Zhu Electrochimica Acta 282, 680-686, 2018 | 29 | 2018 |
Oxidation of the titanium (0001) surface: diffusion processes of oxygen from DFT J Liu, X Fan, C Sun, W Zhu RSC advances 6 (75), 71311-71318, 2016 | 28 | 2016 |
DFT study on intermetallic Pd–Cu alloy with cover layer Pd as efficient catalyst for oxygen reduction reaction J Liu, X Fan, CQ Sun, W Zhu Materials 11 (1), 33, 2017 | 24 | 2017 |
Cobalt metal ALD: Understanding the mechanism and role of zinc alkyl precursors as reductants for low-resistivity Co thin films D Zanders, J Liu, J Obenlüneschloß, C Bock, D Rogalla, L Mai, M Nolan, ... Chemistry of Materials 33 (13), 5045-5057, 2021 | 20 | 2021 |
Coverage and Stability of NHx-Terminated Cobalt and Ruthenium Surfaces: A First-Principles Investigation J Liu, M Nolan The Journal of Physical Chemistry C 123 (41), 25166-25175, 2019 | 11 | 2019 |
Layer effect on catalytic activity of Pd-Cu bimetal for CO oxidation J Liu, X Fan, CQ Sun, W Zhu Applied Catalysis A: General 538, 66-73, 2017 | 10 | 2017 |
DFT study on bimetallic Pt/Cu (1 1 1) as efficient catalyst for H2 dissociation J Liu, X Fan, CQ Sun, W Zhu Applied Surface Science 441, 23-28, 2018 | 9 | 2018 |
Reactions of ruthenium cyclopentadienyl precursor in the metal precursor pulse of Ru atomic layer deposition J Liu, H Lu, DW Zhang, M Nolan Journal of Materials Chemistry C 9 (8), 2919-2932, 2021 | 8 | 2021 |
Self-limiting nitrogen/hydrogen plasma radical chemistry in plasma-enhanced atomic layer deposition of cobalt J Liu, H Lu, DW Zhang, M Nolan Nanoscale 14 (12), 4712-4725, 2022 | 7 | 2022 |
Reaction mechanism of the metal precursor pulse in plasma-enhanced atomic layer deposition of cobalt and the role of surface facets J Liu, H Lu, DW Zhang, M Nolan The Journal of Physical Chemistry C 124 (22), 11990-12000, 2020 | 7 | 2020 |
Atomic Layer Deposition of Intermetallic Fe4Zn9 Thin Films from Diethyl Zinc R Ghiyasi, A Philip, J Liu, J Julin, T Sajavaara, M Nolan, M Karppinen Chemistry of Materials 34 (11), 5241-5248, 2022 | 4 | 2022 |
Transparent conductivity modulation of ZnO by group-IVA doping J Liu, XF Fan, CQ Sun, W Zhu Chemical Physics Letters 649, 78-83, 2016 | 3 | 2016 |
Atomic Layer Deposition of CeOx Nanoclusters on TiO2 J Liu, S Saedy, R Verma, JR van Ommen, M Nolan | 1 | 2020 |
Nucleation of Co and Ru Precursors on Silicon with Different Surface Terminations: Impact on Nucleation Delay J Liu, R Mullins, H Lu, DW Zhang, M Nolan The Journal of Physical Chemistry C 127 (28), 13651-13658, 2023 | | 2023 |
DFT Study on Atomic Layer Deposition of Cerium Dioxide on Hydroxylated Titanium Dioxide As Efficient Photocatalyst J Liu, S Saedy, R Verma, JR Ommen, S Rhatigan, M Nolan Electrochemical Society Meeting Abstracts 237, 2770-2770, 2020 | | 2020 |