| An update of argon inelastic cross sections for plasma discharges A Yanguas-Gil, J Cotrino, LL Alves Journal of Physics D: Applied Physics 38 (10), 1588, 2005 | 198 | 2005 |
| Biological underpinnings for lifelong learning machines D Kudithipudi, M Aguilar-Simon, J Babb, M Bazhenov, D Blackiston, ... Nature Machine Intelligence 4 (3), 196-210, 2022 | 194 | 2022 |
| Inactivation of bacteria and biomolecules by low‐pressure plasma discharges A Von Keudell, P Awakowicz, J Benedikt, V Raballand, A Yanguas‐Gil, ... Plasma Processes and Polymers 7 (3‐4), 327-352, 2010 | 179 | 2010 |
| Atmospheric pressure microplasma jet as a depositing tool J Benedikt, K Focke, A Yanguas-Gil, A Von Keudell Applied Physics Letters 89 (25), 2006 | 160 | 2006 |
| A robust method to measure metastable and resonant state densities from emission spectra in argon and argon-diluted low pressure plasmas M Schulze, A Yanguas-Gil, A von Keudell, P Awakowicz Journal of Physics D: Applied Physics 41 (6), 065206, 2008 | 131 | 2008 |
| Thin film deposition by means of atmospheric pressure microplasma jet J Benedikt, V Raballand, A Yanguas-Gil, K Focke, A Von Keudell Plasma physics and controlled fusion 49 (12B), B419, 2007 | 119 | 2007 |
| Optical and electrical characterization of an atmospheric pressure microplasma jet for Ar∕ CH4 and Ar∕ C2H2 mixtures A Yanguas-Gil, K Focke, J Benedikt, A Von Keudell Journal of applied physics 101 (10), 2007 | 115 | 2007 |
| Consistency and reproducibility in atomic layer deposition HH Sønsteby, A Yanguas-Gil, JW Elam Journal of Vacuum Science & Technology A 38 (2), 2020 | 109 | 2020 |
| The chemical physics of sequential infiltration synthesis—A thermodynamic and kinetic perspective RZ Waldman, DJ Mandia, A Yanguas-Gil, ABF Martinson, JW Elam, ... The Journal of chemical physics 151 (19), 2019 | 100 | 2019 |
| Reforming of ethanol in a microwave surface-wave plasma discharge A Yanguas-Gil, JL Hueso, J Cotrino, A Caballero, AR González-Elipe Applied physics letters 85, 4004, 2004 | 98 | 2004 |
| Measuring the electron temperature by optical emission spectroscopy in two temperature plasmas at atmospheric pressure: A critical approach A Yanguas-Gil, J Cotrino, AR González-Elipe Journal of applied physics 99, 033104, 2006 | 83 | 2006 |
| Modulation of the growth per cycle in atomic layer deposition using reversible surface functionalization A Yanguas-Gil, JA Libera, JW Elam Chemistry of Materials 25 (24), 4849-4860, 2013 | 67 | 2013 |
| Self‐Limited Reaction‐Diffusion in Nanostructured Substrates: Surface Coverage Dynamics and Analytic Approximations to ALD Saturation Times A Yanguas‐Gil, JW Elam Chemical Vapor Deposition 18 (1‐3), 46-52, 2012 | 67 | 2012 |
| Highly conformal film growth by chemical vapor deposition. I. A conformal zone diagram based on kinetics A Yanguas-Gil, Y Yang, N Kumar, JR Abelson Journal of Vacuum Science & Technology A 27 (5), 1235-1243, 2009 | 63 | 2009 |
| Analysis of favorable process conditions for the manufacturing of thin-wall pieces of mild steel obtained by wire and arc additive manufacturing (WAAM) JL Prado-Cerqueira, AM Camacho, JL Diéguez, Á Rodríguez-Prieto, ... Materials 11 (8), 1449, 2018 | 61 | 2018 |
| Influence of the Angular Distribution Function of Incident Particles on the Microstructure<? format?> and Anomalous Scaling Behavior of Thin Films A Yanguas-Gil, J Cotrino, A Barranco, AR Gonzalez-Elipe Physical review letters 96 (23), 236101, 2006 | 56 | 2006 |
| Controlled dopant distribution and higher doping efficiencies by surface-functionalized atomic layer deposition A Yanguas-Gil, KE Peterson, JW Elam Chemistry of Materials 23 (19), 4295-4297, 2011 | 51 | 2011 |
| Highly conformal magnesium oxide thin films by low-temperature chemical vapor deposition from Mg (H3BNMe2BH3) 2 and water WB Wang, Y Yang, A Yanguas-Gil, NN Chang, GS Girolami, JR Abelson Applied physics letters 102 (10), 2013 | 50 | 2013 |
| Growth and transport in nanostructured materials: reactive transport in PVD, CVD, and ALD A Yanguas-Gil Springer, 2016 | 47 | 2016 |
| Growth inhibition to enhance conformal coverage in thin film chemical vapor deposition N Kumar, A Yanguas-Gil, SR Daly, GS Girolami, JR Abelson Journal of the American Chemical Society 130 (52), 17660-17661, 2008 | 46 | 2008 |
