| Sensing with advanced computing technology: Fin field-effect transistors with high-k gate stack on bulk silicon S Rigante, P Scarbolo, M Wipf, RL Stoop, K Bedner, E Buitrago, ... ACS nano 9 (5), 4872-4881, 2015 | 58 | 2015 |
| RF MEMS Shunt Capacitive Switches Using AlN Compared to Si3N4 Dielectric M Fernández-Bolaños Badía, E Buitrago, AM Ionescu IEEE, 2012 | 43* | 2012 |
| Improvements in resist performance towards EUV HVM O Yildirim, E Buitrago, R Hoefnagels, M Meeuwissen, S Wuister, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 101430Q, 2017 | 39 | 2017 |
| Junctionless silicon nanowire transistors for the tunable operation of a highly sensitive, low power sensor E Buitrago, G Fagas, MFB Badia, YM Georgiev, M Berthomé, AM Ionescu Sensors and Actuators B: Chemical 183, 1-10, 2013 | 36 | 2013 |
| SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci Microelectronic Engineering 155, 44-49, 2016 | 33 | 2016 |
| Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates R Del Re, J Passarelli, M Sortland, B Cardineau, Y Ekinci, E Buitrago, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 043506, 2015 | 27 | 2015 |
| Nanoparticle synthesis and growth in a continuous plasma reactor from organosilicon precursors C Roth, G Oberbossel, E Buitrago, R Heuberger, P Rudolf von Rohr Plasma Processes and Polymers 9 (2), 119-134, 2012 | 27 | 2012 |
| Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography E Buitrago, S Nagahara, O Yildirim, H Nakagawa, S Tagawa, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033502, 2016 | 26 | 2016 |
| The top-down fabrication of a 3D-integrated, fully CMOS-compatible FET biosensor based on vertically stacked SiNWs and FinFETs E Buitrago, M Fernandez-Bolanos, S Rigante, CF Zilch, NS Schroeter, ... Sensors and Actuators B: Chemical 193, 400-412, 2014 | 26 | 2014 |
| Novel high sensitivity EUV photoresist for sub-7 nm node T Nagai, H Nakagawa, T Naruoka, S Dei, S Tagawa, A Oshima, ... Journal of Photopolymer Science and Technology 29 (3), 475-478, 2016 | 24 | 2016 |
| Materials and Processes for Next Generation Lithography A Robinson, R Lawson Elsevier, 2016 | 22 | 2016 |
| Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure S Nagahara, M Carcasi, H Nakagawa, E Buitrago, O Yildirim, G Shiraishi, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 977607, 2016 | 22 | 2016 |
| Electrical characterization of high performance, liquid gated vertically stacked SiNW-based 3D FET biosensors E Buitrago, MFB Badia, YM Georgiev, R Yu, O Lotty, JD Holmes, ... Sensors and Actuators B: Chemical 199, 291-300, 2014 | 21 | 2014 |
| Evaluation of EUV resist performance using interference lithography E Buitrago, O Yildirim, C Verspaget, N Tsugama, R Hoefnagels, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 94221S, 2015 | 20 | 2015 |
| Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility D Fan, E Buitrago, S Yang, W Karim, Y Wu, R Tai, Y Ekinci Microelectronic Engineering 155, 55-60, 2016 | 18 | 2016 |
| Carbon nanotube gas sensor array for multiplex analyte discrimination H Guerin, H Le Poche, R Pohle, E Buitrago, MFB Badía, J Dijon, ... Sensors and Actuators B: Chemical 207, 833-842, 2015 | 18 | 2015 |
| State-of-the-art EUV materials and processes for the 7nm node and beyond E Buitrago, M Meeuwissen, O Yildirim, R Custers, R Hoefnagels, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 101430T, 2017 | 17 | 2017 |
| Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher … S Nagahara, M Carcasi, G Shiraishi, H Nakagawa, S Dei, T Shiozawa, ... Advances in Patterning Materials and Processes XXXIV 10146, 101460G, 2017 | 15 | 2017 |
| High-yield, in-situ fabrication and integration of horizontal carbon nanotube arrays at the wafer scale for robust ammonia sensors H Guerin, H Le Poche, R Pohle, LS Bernard, E Buitrago, R Ramos, ... Carbon 78, 326-338, 2014 | 14 | 2014 |
| Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography E Buitrago, S Nagahara, O Yildirim, H Nakagawa, S Tagawa, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 97760Z, 2016 | 13 | 2016 |
Yasin EkinciPaul Scherrer InstituteVerified email at psi.ch
