| Silicon nanowires integrated with CMOS circuits for biosensing application G Jayakumar, A Asadollahi, PE Hellström, K Garidis, M Östling Solid-state electronics 98, 26-31, 2014 | 19 | 2014 |
| Epitaxial growth of Ge strain relaxed buffer on Si with low threading dislocation density A Abedin, A Asadollahi, K Garidis, PE Hellström, M Ostling ECS Transactions 75 (8), 615, 2016 | 18 | 2016 |
| Germanium on insulator fabrication for monolithic 3-D integration A Abedin, L Zurauskaite, A Asadollahi, K Garidis, G Jayakumar, BG Malm, ... IEEE Journal of the Electron Devices Society 6, 588-593, 2018 | 11 | 2018 |
| Mask roughness impact on extreme UV and 193 nm immersion lithography K Garidis, AV Pret, R Gronheid Microelectronic engineering 98, 138-141, 2012 | 11 | 2012 |
| Fabrication and characterization of silicon nanowires using STL for biosensing applications G Jayakumar, K Garidis, PE Hellström, M Östling 2014 15th International Conference on Ultimate Integration on Silicon (ULIS …, 2014 | 9 | 2014 |
| Characterization of bonding surface and electrical insulation properties of inter layer dielectrics for 3D monolithic integration K Garidis, G Jayakumar, A Asadollahi, ED Litta, PE Hellström, M Östling EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop and …, 2015 | 8 | 2015 |
| Stochastic limitations for EUV resist kinetics towards the 16nm node AV Pret, K Garidis, R Gronheid, J Biafore 2011 International EUVL Symposium, 2011 | 8 | 2011 |
| GOI fabrication for monolithic 3D integration A Abedin, L Žurauskaitė, A Asadollahi, K Garidis, G Jayakumar, BG Malm, ... 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference …, 2017 | 3 | 2017 |
| Silicon nanowires integrated in a fully depleted CMOS process for charge based biosensing G Jayakumar, A Asadollahi, PE Hellström, K Garidis, M Östling 2013 14th International Conference on Ultimate Integration on Silicon (ULIS …, 2013 | 3 | 2013 |
| Mask effects on resist variability in extreme ultraviolet lithography AV Pret, R Gronheid, J Engelen, PY Yan, MJ Leeson, TR Younkin, ... Japanese Journal of Applied Physics 52 (6S), 06GC02, 2013 | 2 | 2013 |
| Applications of Si1-xGex alloys for Ge devices and monolithic 3D integration K Garidis KTH Royal Institute of Technology, 2020 | 1 | 2020 |
| Growth of epitaxial SiGe alloys as etch-stop layers in germanium-on-insulator fabrication A Abedin, K Garidis, A Asadollahi, PE Hellström, M Östling | | 2021 |
| Selective Epitaxial Growth of In Situ Doped SiGe on Bulk Ge for p+/n Junction Formation K Garidis, A Abedin, A Asadollahi, PE Hellström, M Östling Electronics 9 (4), 578, 2020 | | 2020 |
| Selective epitaxial growth of in situ doped SiGe on bulk Ge substrates forp+/n junction formation K Garidis, A Abedin, A Asadollahi, PE Hellström, M Östling | | 2020 |
| Amini Moghadam, H., see Pande, P., JEDS 2018 468-474 Anderson, JD, Merkel, J., Macmahon, D., and Kurinec, SK, Evaluation of Si: HfO2 Ferroelectric Properties in MFM and MFIS … A Abedin, L Zurauskaite, A Asadollahi, K Garidis, G Jayakumar, BG Malm, ... IEEE Journal of the Electron Devices Society 6 (1), 1259, 2018 | | 2018 |
| IR-Photodetector Fabrication on Suspended Gesn Thin Layers A Abedin, K Garidis, PE Hellström, M Ostling Electrochemical Society Meeting Abstracts aimes2018, 1023-1023, 2018 | | 2018 |
| Stochastic effects and resist variability in high resolution lithography A Vaglio Pret, K Garidis, R Gronheid, J Biafore | | 2012 |
| Stochastic limitations for EUV resist kinetics towards the 16nm node A Vaglio Pret, K Garidis, R Gronheid, J Biafore | | 2011 |
Mikael ÖstlingKTH Royal Institute of TechnologyVerified email at kth.se
