Följ
Jen-Yi Wuu
Jen-Yi Wuu
ASML Brion
Verifierad e-postadress på asml.com
Titel
Citeras av
Citeras av
År
Hotspot detection based on machine learning
JAT Robles, SM Fahmy, K Madkour, JY Wuu
US Patent 8,402,397, 2013
1262013
Rapid layout pattern classification
JY Wuu, FG Pikus, A Torres, M Marek-Sadowska
16th Asia and South Pacific Design Automation Conference (ASP-DAC 2011), 781-786, 2011
722011
Efficient approach to early detection of lithographic hotspots using machine learning systems and pattern matching
JY Wuu, FG Pikus, M Marek-Sadowska
Design for Manufacturability through Design-Process Integration V 7974, 243-250, 2011
372011
Detecting context sensitive hot spots in standard cell libraries
JY Wuu, FG Pikus, A Torres, M Marek-Sadowska
Design for Manufacturability through Design-Process Integration III 7275 …, 2009
352009
Hybrid hotspot detection
JAT Robles, SM Fahmy, PLR Beshay, K Madkour, FG Pikus, JY Wuu, ...
US Patent 8,504,949, 2013
262013
Soc test scheduling using the b-tree based floorplanning technique
JY Wuu, TC Chen, YW Chang
Proceedings of the 2005 Asia and South Pacific Design Automation Conference …, 2005
262005
Fast and simple modeling of non-rectangular transistors
JY Wuu, FG Pikus, M Marek-Sadowska
Photomask Technology 2008 7122, 1207-1216, 2008
132008
Metrics for characterizing machine learning-based hotspot detection methods
JY Wuu, FG Pikus, M Marek-Sadowska
2011 12th International Symposium on Quality Electronic Design, 1-6, 2011
62011
Methods for generating characteristic pattern and training machine learning model
MC Simmons, C Lin, JY Wuu
US Patent App. 17/281,123, 2021
32021
Stochastic defect criticality prediction enabled by physical stochastic modeling and massive metrology
CA Wang, P Cao, M Delorme, JY Wuu, J Fu, F Wang, B Lin, Y Zhao, ...
Extreme Ultraviolet (EUV) Lithography XII 11609, 95-103, 2021
32021
Post-placement lithographic hotspot detection and removal in one-dimensional gridded designs
JY Wuu, M Simmons, M Marek-Sadowska
Thirteenth International Symposium on Quality Electronic Design (ISQED), 193-199, 2012
22012
Feature extraction method for extracting feature vectors for identifying pattern objects
LI Danying, M Liu, JY Wuu, SUN Rencheng, C Wu, D Xu
US Patent App. 18/265,431, 2024
2024
Systems, products, and methods for image-based pattern selection
SUN Rencheng, Q Jia, M Liu, HU Weixuan, JY Wuu, H Chen
US Patent App. 18/018,034, 2023
2023
Layout optimization through robust pattern learning and prediction in SADP gridded designs
JY Wuu, M Simmons, M Marek-Sadowska
Design for Manufacturability through Design-Process Integration VI 8327, 42-48, 2012
2012
Design Methodologies for Optical Lithography Induced Systematic Variations
JY Wuu
University of California, Santa Barbara, 2011
2011
Systemet kan inte utföra åtgärden just nu. Försök igen senare.
Artiklar 1–15