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Raphael Ramos
Raphael Ramos
researcher, CEA LITEN (Grenoble)
Verified email at cea.fr
Title
Cited by
Cited by
Year
New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes
G Cunge, B Pelissier, O Joubert, R Ramos, C Maurice
Plasma Sources Science and Technology 14 (3), 599, 2005
1302005
No cytotoxicity or genotoxicity of graphene and graphene oxide in murine lung epithelial FE1 cells in vitro
S Bengtson, K Kling, AM Madsen, AW Noergaard, NR Jacobsen, ...
Environmental and molecular mutagenesis 57 (6), 469-482, 2016
1012016
Cleaning aluminum fluoride coatings from plasma reactor walls in SiCl4/Cl2 plasmas
R Ramos, G Cunge, B Pelissier, O Joubert
Plasma Sources Science and Technology 16 (4), 711, 2007
732007
Etching mechanisms of , , and poly-Si substrates in plasmas
E Sungauer, E Pargon, X Mellhaoui, R Ramos, G Cunge, L Vallier, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
662007
Enhanced ionic liquid mobility induced by confinement in 1D CNT membranes
Q Berrod, F Ferdeghini, P Judeinstein, N Genevaz, R Ramos, A Fournier, ...
Nanoscale 8 (15), 7845-7848, 2016
612016
Gas temperature measurement in CF4, SF6, O2, Cl2, and HBr inductively coupled plasmas
G Cunge, R Ramos, D Vempaire, M Touzeau, M Neijbauer, N Sadeghi
Journal of Vacuum Science & Technology A 27 (3), 471-478, 2009
592009
Radical surface interactions in industrial silicon plasma etch reactors
G Cunge, D Vempaire, R Ramos, M Touzeau, O Joubert, P Bodard, ...
Plasma Sources Science and Technology 19 (3), 034017, 2010
522010
Influence of the reactor wall composition on radicals' densities and total pressure in Cl2 inductively coupled plasmas: I. Without silicon etching
G Cunge, N Sadeghi, R Ramos
Journal of Applied Physics 102 (9), 2007
412007
Influence of the reactor wall composition on radicals’ densities and total pressure in Cl2 inductively coupled plasmas: II. During silicon etching
G Cunge, N Sadeghi, R Ramos
Journal of Applied Physics 102 (9), 2007
412007
Plasma/reactor walls interactions in advanced gate etching processes
R Ramos, G Cunge, O Joubert, N Sadeghi, M Mori, L Vallier
Thin Solid Films 515 (12), 4846-4852, 2007
382007
A survey of carbon nanotube interconnects for energy efficient integrated circuits
A Todri-Sanial, R Ramos, H Okuno, J Dijon, A Dhavamani, M Widlicenus, ...
IEEE Circuits and Systems Magazine 17 (2), 47-62, 2017
342017
Vertically-aligned carbon nanotubes on aluminum as a light-weight positive electrode for lithium-polysulfide batteries
S Liatard, K Benhamouda, A Fournier, R Ramos, C Barchasz, J Dijon
Chemical communications 51 (36), 7749-7752, 2015
302015
Direct growth of carbon nanotubes forests on carbon fibers to replace microporous layers in proton exchange membrane fuel cells
M Fontana, R Ramos, A Morin, J Dijon
Carbon 172, 762-771, 2021
272021
Near-field artifacts in tip-enhanced Raman spectroscopy
R Ramos, MJ Gordon
Applied Physics Letters 100 (21), 2012
232012
Measured velocity distribution of sputtered Al atoms perpendicular and parallel to the target
R Ramos, G Cunge, M Touzeau, N Sadeghi
Journal of Physics D: Applied Physics 41 (15), 152003, 2008
212008
Absorption spectroscopy in BCl3 inductively coupled plasmas: determination of density, rotational, translational and vibrational temperatures of BCl molecule
R Ramos, G Cunge, M Touzeau, N Sadeghi
Journal of Physics D: Applied Physics 41 (11), 115205, 2008
212008
High-yield, in-situ fabrication and integration of horizontal carbon nanotube arrays at the wafer scale for robust ammonia sensors
H Guerin, H Le Poche, R Pohle, LS Bernard, E Buitrago, R Ramos, ...
Carbon 78, 326-338, 2014
202014
On the interest of carbon-coated plasma reactor for advanced gate stack etching processes
R Ramos, G Cunge, O Joubert
Journal of Vacuum Science & Technology A 25 (2), 290-303, 2007
182007
Plasma reactor dry cleaning strategy after TiN, TaN and HfO2 etching processes
R Ramos, G Cunge, O Joubert
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
172008
Investigation of Pt-salt-doped-standalone-multiwall carbon nanotubes for on-chip interconnect applications
J Liang, R Chen, R Ramos, J Lee, H Okuno, D Kalita, V Georgiev, ...
IEEE Transactions on Electron Devices 66 (5), 2346-2352, 2019
162019
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