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Ming-Cheng Chang
Ming-Cheng Chang
Verified email at globalfoundries.com
Title
Cited by
Cited by
Year
Impact of gate-induced drain leakage on retention time distribution of 256 Mbit DRAM with negative wordline bias
M Chang, J Lin, SN Shih, TC Wu, B Huang, J Yang, PI Lee
IEEE Transactions on Electron Devices 50 (4), 1036-1041, 2003
592003
Si-H bond breaking induced retention degradation during packaging process of 256 Mbit DRAMs with negative wordline bias
M Chang, J Lin, CS Lai, RD Chang, SN Shih, MY Wang, PI Lee
IEEE transactions on electron devices 52 (4), 484-491, 2005
272005
Machine housing
P Steuer, D Schneider
US Patent 6,710,485, 2004
92004
Deep fence isolation for logic cells
MC Chang, N Chan, EJ Smith
US Patent 10,593,674, 2020
32020
Novel back gate doping ultra low retention power 22nm FDSOL SRAM for IoT application
M Chang, N Chan, V Joshi, S Hecker, U Ziller, P Poth, A Zaka, ...
2018 48th European Solid-State Device Research Conference (ESSDERC), 78-81, 2018
32018
Laterally diffused field effect transistor in soi configuration
R Yan, MC Chang, T Merbeth
US Patent App. 15/622,591, 2018
22018
Method of forming a capacitor structure and capacitor structure
R Yan, MC Chang, R Richter
US Patent 9,941,348, 2018
22018
Dual-depth STI cavity extension and method of production thereof
EJ Smith, N Chan, MC Chang
US Patent 10,559,490, 2020
12020
Metal Routing Induced Burnout in GGNMOS ESD Protection for Low-Power DRAM Application
M Chang
36th EOS/ESD symposium, 2014
12014
22FDX EDMOS for 5G mmW Power Amplifier Applications
M Chang, Z Al-Husseini, S Syed, SN Ong, LHK Chan, W Arfaoui, D Lipp, ...
2023 18th European Microwave Integrated Circuits Conference (EuMIC), 301-304, 2023
2023
22FDX® Device Optimization for mmW PA
M Chang, Z Al-Husseini, S Syed, W Arfaoui, T Chen, A Knorr
ESSDERC 2023-IEEE 53rd European Solid-State Device Research Conference …, 2023
2023
Enabling medium thick gate oxide devices in 22FDX® technology for switch and high-performance amplifier application
T Herrmann, A Zaka, Z Zhao, B Syamal, W Arfaoui, R Jain, MC Chang, ...
Solid-State Electronics 199, 108512, 2023
2023
Extended-drain field-effect transistors including a floating gate
MC Chang, N Chan
US Patent 11,127,860, 2021
2021
FinFET SRAM layout and method of making the same
MC Chang, N Chan, R van Bentum
US Patent 10,504,906, 2019
2019
Semiconductor device including fdsoi transistors with compact ground connection via back gate
N Chan, EJ Smith, MC Chang
US Patent App. 15/948,016, 2019
2019
FinFET device with enlarged channel regions
MC Chang, R Yan, B Bai
US Patent 9,748,236, 2017
2017
Packaging process induced retention degradation of 256 Mbit DRAM with negative wordline bias
M Chang, J Lin, RD Chang, SN Shih, CS Lai, PI Lee
Proceedings of the 11th International Symposium on the Physical and Failure …, 2004
2004
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