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Christopher D Himmel
Christopher D Himmel
Intuit
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Title
Cited by
Cited by
Year
Advantages of plasma etch modeling using neural networks over statistical techniques
CD Himmel, GS May
IEEE Transactions on semiconductor manufacturing 6 (2), 103-111, 1993
2571993
Time series modeling of reactive ion etching using neural networks
MD Baker, CD Himmel, GS May
IEEE Transactions on Semiconductor Manufacturing 8 (1), 62-71, 1995
751995
In-situ prediction of reactive ion etch endpoint using neural networks
MD Baker, CD Himmel, GS May
IEEE Transactions on Components, Packaging, and Manufacturing Technology …, 1995
351995
A comparison of statistically-based and neural network models of plasma etch behavior
CD Himmel, B Kim, GS May
[1992 Proceedings] IEEE/SEMI International Semiconductor Manufacturing …, 1992
321992
Real-time predictive control of semiconductor manufacturing processes using neural networks
CD Himmel, TS Kim, A Krauss, EW Kamen, GS May
Proceedings of 1995 American Control Conference-ACC'95 2, 1240-1244, 1995
171995
In-situ prediction of RIE time to completion using neural networks
D Baker, CD Himmel, GS May
Proceedings of 16th IEEE/CPMT International Electronic Manufacturing …, 1994
11994
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Articles 1–6