Ulf Helmersson
Ulf Helmersson
Verified email at liu.se
Title
Cited by
Cited by
Year
A novel pulsed magnetron sputter technique utilizing very high target power densities
V Kouznetsov, K Macak, JM Schneider, U Helmersson, I Petrov
Surface and coatings technology 122 (2-3), 290-293, 1999
10751999
Ionized physical vapor deposition (IPVD): A review of technology and applications
U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...
Thin solid films 513 (1-2), 1-24, 2006
10592006
Growth of single‐crystal TiN/VN strained‐layer superlattices with extremely high mechanical hardness
U Helmersson, S Todorova, SA Barnett, JE Sundgren, LC Markert, ...
Journal of Applied Physics 62 (2), 481-484, 1987
8791987
High power impulse magnetron sputtering discharge
JT Gudmundsson, N Brenning, D Lundin, U Helmersson
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30 (3 …, 2012
5552012
Optical properties of anatase TiO2 thin films prepared by aqueous sol–gel process at low temperature
Z Wang, U Helmersson, PO Käll
Thin Solid Films 405 (1-2), 50-54, 2002
3932002
Influence of high power densities on the composition of pulsed magnetron plasmas
AP Ehiasarian, R New, WD Münz, L Hultman, U Helmersson, ...
Vacuum 65 (2), 147-154, 2002
3422002
Microstructure modification of TiN by ion bombardment during reactive sputter deposition
I Petrov, L Hultman, U Helmersson, JE Sundgren, JE Greene
Thin Solid Films 169 (2), 299-314, 1989
3361989
On the film density using high power impulse magnetron sputtering
M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...
Surface and Coatings Technology 205 (2), 591-596, 2010
3322010
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...
Thin Solid Films 515 (4), 1522-1526, 2006
3172006
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
K Macák, V Kouznetsov, J Schneider, U Helmersson, I Petrov
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000
3062000
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
K Macák, V Kouznetsov, J Schneider, U Helmersson, I Petrov
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000
3062000
Ionization of sputtered metals in high power pulsed magnetron sputtering
J Bohlmark, J Alami, C Christou, AP Ehiasarian, U Helmersson
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23 (1 …, 2005
2792005
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
J Alami, POÅ Persson, D Music, JT Gudmundsson, J Bohlmark, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23 (2 …, 2005
2572005
Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered …
AP Ehiasarian, PE Hovsepian, L Hultman, U Helmersson
Thin solid films 457 (2), 270-277, 2004
2522004
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
JT Gudmundsson, J Alami, U Helmersson
Surface and Coatings Technology 161 (2-3), 249-256, 2002
2382002
A spectroscopic ellipsometry study of cerium dioxide thin films grown on sapphire by rf magnetron sputtering
S Guo, H Arwin, SN Jacobsen, K Järrendahl, U Helmersson
Journal of Applied physics 77 (10), 5369-5376, 1995
1861995
Low‐temperature superionic conductivity in strained yttria‐stabilized zirconia
M Sillassen, P Eklund, N Pryds, E Johnson, U Helmersson, J Bøttiger
Advanced Functional Materials 20 (13), 2071-2076, 2010
1692010
Cross-field ion transport during high power impulse magnetron sputtering
D Lundin, P Larsson, E Wallin, M Lattemann, N Brenning, U Helmersson
Plasma Sources Science and Technology 17 (3), 035021, 2008
1672008
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
JT Gudmundsson, J Alami, U Helmersson
Applied Physics Letters 78 (22), 3427-3429, 2001
1612001
Hysteresis-free reactive high power impulse magnetron sputtering
E Wallin, U Helmersson
Thin Solid Films 516 (18), 6398-6401, 2008
1522008
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