Diamond disc pad conditioning in chemical mechanical planarization (CMP): a surface element method to predict pad surface shape ZC Li, EA Baisie, XH Zhang Precision engineering 36 (2), 356-363, 2012 | 45 | 2012 |
Design optimization of diamond disk pad conditioners EA Baisie, ZC Li, XH Zhang The International Journal of Advanced Manufacturing Technology 66, 2041-2052, 2013 | 25 | 2013 |
Pad conditioning in chemical mechanical polishing: a conditioning density distribution model to predict pad surface shape EA Baisie, Z Li, X Zhang International Journal of Manufacturing Research 8 (1), 103-119, 2013 | 23 | 2013 |
Diamond disc pad conditioning in chemical mechanical polishing ZC Li, EA Baisie, XH Zhang, Q Zhang Advances in Chemical Mechanical Planarization (CMP), 383-412, 2022 | 7 | 2022 |
Diamond disc pad conditioning in chemical mechanical polishing: a literature review of process modeling EA Baisie, ZC Li, XH Zhang International Manufacturing Science and Engineering Conference 43611, 661-670, 2009 | 7 | 2009 |
Finite Element Analysis (FEA) of pad deformation due to diamond disc conditioning in Chemical Mechanical Polishing (CMP) E Baisie, B Lin, X Zhang, Z Li ECS Transactions 34 (1), 633, 2011 | 5 | 2011 |
Simulation of diamond disc conditioning in chemical mechanical polishing: effects of conditioning parameters on pad surface shape EA Baisie, ZC Li, XH Zhang International Manufacturing Science and Engineering Conference 49477, 169-177, 2010 | 5 | 2010 |
Finite Element Modeling of Pad Deformation due to Diamond Disc Conditioning in Chemical Mechanical Polishing (CMP) EA Baisie, ZC Li, XH Zhang International Manufacturing Science and Engineering Conference 54990, 209-215, 2012 | 1 | 2012 |
A New Image Processing Method to Characterize Pad Foam Morphology in Chemical Mechanical Polishing E Baisie, B Lin, X Zhang, Z Li ECS Transactions 44 (1), 587, 2012 | 1 | 2012 |
Design and Simulation of Coronary Stents A Vaizasatya, EA Baisie, Z Xu, ZC Li IIE Annual Conference. Proceedings, 1, 2012 | 1 | 2012 |
An economic study on chemical mechanical polishing of silicon wafers EA Baisie, M Yang, R Kaware, M Hooker, ZC Li, W Sun, XH Zhang International Manufacturing Science and Engineering Conference 43611, 691-697, 2009 | 1 | 2009 |
13 - Diamond disc pad conditioning in chemical mechanical polishing XHZQZ Z.C. Li, E.A. Baisie Advances in Chemical Mechanical Planarization (CMP) by Suryadevara Babu, 1 …, 2016 | | 2016 |
Design Optimization of Grit Arrangement for Diamond Disc Pad Conditioners EA Baisie, ZC Li, XH Zhang IIE Annual Conference. Proceedings, 1, 2012 | | 2012 |
Economic Study of Heterogeneous Catalysis Biodiesel Production on the EcoComplex J Akyeampong, E Baisie, Q Brown, TK Ahmed, JC Ferrell IIE Annual Conference. Proceedings, 1, 2012 | | 2012 |
Modeling, Simulation, And Optimization Of Diamond Disc Pad Conditioning In Chemical Mechanical Polishing EA Baisie | | 2012 |
Diamond disc pad conditioning in chemical mechanical planarization (CMP) Z Li, EA Baisie, XH Zhang ASME 2011 International Manufacturing Science and Engineering Conference …, 2011 | | 2011 |
Lean Thinking for Biofuel Manufacture EA Baisie, Y Ahmed, ZC Li IIE Annual Conference. Proceedings, 1, 2011 | | 2011 |
Diamond disc pad conditioning in chemical mechanical polishing EA Baisie, Z Li, XH Zhang ASME International Manufacturing Science and Engineering Conference 2009 …, 2009 | | 2009 |