| Absorption coefficient of metal-containing photoresists in the extreme ultraviolet R Fallica, J Haitjema, L Wu, S Castellanos, AM Brouwer, Y Ekinci Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (2), 023505-023505, 2018 | 52 | 2018 |
| Complexation behavior of poly (acrylic acid) and lanthanide ions X Qi, Z Wang, S Ma, L Wu, S Yang, J Xu Polymer 55 (5), 1183-1189, 2014 | 50 | 2014 |
| Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography CD Dieleman, W Ding, L Wu, N Thakur, I Bespalov, B Daiber, Y Ekinci, ... Nanoscale 12 (20), 11306-11316, 2020 | 39 | 2020 |
| Mechanistic insights in Zr-and Hf-based molecular hybrid EUV photoresists L Wu, M Baljozovic, G Portale, D Kazazis, M Vockenhuber, T Jung, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 18 (1), 013504-013504, 2019 | 36 | 2019 |
| Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists S Castellanos, L Wu, M Baljozovic, G Portale, D Kazazis, M Vockenhuber, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 58-69, 2018 | 30 | 2018 |
| Absorption coefficient and exposure kinetics of photoresists at EUV R Fallica, J Haitjema, L Wu, S Castellanos, F Brouwer, Y Ekinci Extreme Ultraviolet (EUV) Lithography VIII 10143, 29-39, 2017 | 27 | 2017 |
| Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications L Wu, M Tiekink, A Giuliani, L Nahon, S Castellanos Journal of Materials Chemistry C 7 (1), 33-37, 2019 | 25 | 2019 |
| Photo-induced fragmentation of a tin-oxo cage compound J Haitjema, L Wu, A Giuliani, L Nahon, S Castellanos, AM Brouwer Journal of Photopolymer Science and Technology 31 (2), 243-247, 2018 | 25 | 2018 |
| Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy L Wu, I Bespalov, K Witte, O Lugier, J Haitjema, M Vockenhuber, Y Ekinci, ... Journal of Materials Chemistry C 8 (42), 14757-14765, 2020 | 22 | 2020 |
| Dissolution, hydrolysis and crystallization behavior of polyamide 6 in superheated water Z Wang, J Xu, L Wu, X Chen, S Yang, H Liu, X Zhou Chinese Journal of Polymer Science 33 (9), 1334-1343, 2015 | 19 | 2015 |
| UV and VUV-induced fragmentation of tin-oxo cage ions J Haitjema, L Wu, A Giuliani, L Nahon, S Castellanos, AM Brouwer Physical Chemistry Chemical Physics 23 (37), 20909-20918, 2021 | 18 | 2021 |
| Fluorescent labeling to investigate nanopatterning processes in extreme ultraviolet lithography L Wu, MF Hilbers, O Lugier, N Thakur, M Vockenhuber, Y Ekinci, ... ACS Applied Materials & Interfaces 13 (43), 51790-51798, 2021 | 14 | 2021 |
| Hybrid EUV resists with mixed organic shells: a simple preparation method L Wu, J Liu, M Vockenhuber, Y Ekinci, S Castellanos European Journal of Inorganic Chemistry 2019 (38), 4136-4141, 2019 | 14 | 2019 |
| The role of the organic shell in hybrid molecular materials for EUV lithography L Wu, M Vockenhuber, Y Ekinci, S Castellanos Extreme Ultraviolet (EUV) Lithography X 10957, 19-25, 2019 | 12 | 2019 |
| Bottom-up nanofabrication with extreme-ultraviolet light: Metal–organic frameworks on patterned monolayers O Lugier, N Thakur, L Wu, M Vockenhuber, Y Ekinci, S Castellanos ACS Applied Materials & Interfaces 13 (36), 43777-43786, 2021 | 7 | 2021 |
| Extreme ultraviolet-excited time-resolved luminescence spectroscopy using an ultrafast table-top high-harmonic generation source MLS Van Der Geest, N Sadegh, TM Meerwijk, EI Wooning, L Wu, R Bloem, ... Review of Scientific Instruments 92 (11), 2021 | 3 | 2021 |
| Correction: UV and VUV-induced fragmentation of tin-oxo cage ions J Haitjema, L Wu, A Giuliani, L Nahon, S Castellanos, AM Brouwer Physical Chemistry Chemical Physics 25 (47), 32728-32728, 2023 | | 2023 |
| Metal oxo clusters: Molecular design for extreme ultraviolet lithography L Wu University of Amsterdam, 2020 | | 2020 |
Sonia CastellanosARCNLVerified email at arcnl.nl
