| Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging I Mochi, S Fernandez, R Nebling, U Locans, R Rajeev, A Dejkameh, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 19 (1), 014002-014002, 2020 | 17 | 2020 |
| Absorber and phase defect inspection on EUV reticles using RESCAN I Mochi, S Fernandez, R Nebling, U Locans, P Helfenstein, R Rajeev, ... Extreme Ultraviolet (EUV) Lithography X 10957, 211-218, 2019 | 16 | 2019 |
| Illumination control in lensless imaging for EUV mask inspection and review I Mochi, HS Kim, U Locans, A Dejkameh, R Nebling, D Kazazis, Y Ekinici Extreme Ultraviolet (EUV) Lithography XI 11323, 372-380, 2020 | 12 | 2020 |
| EUV reticle inspection using phase retrieval algorithms: a performance comparison R Nebling, I Mochi, D Kazazis, U Locans, A Dejkameh, Y Ekinci International Conference on Extreme Ultraviolet Lithography 2019 11147, 95-101, 2019 | 11 | 2019 |
| Lensless metrology for semiconductor lithography at EUV I Mochi, D Kazazis, LT Tseng, S Fernandez, R Rajeev, U Locans, ... Modeling Aspects in Optical Metrology VII 11057, 1105703, 2019 | 6 | 2019 |
| High resolution and uniform image reconstruction in a large field-of-view for EUV actinic mask review H Kim, U Locans, R Nebling, A Dejkameh, D Kazazis, Y Ekinci, I Mochi Photomask Technology 2020 11518, 146-152, 2020 | 5 | 2020 |
| Resolution enhancement for lensless mask metrology with RESCAN I Mochi, U Locans, A Dejkameh, R Nebling, D Kazazis, LT Tseng, Y Ekinci International Conference on Extreme Ultraviolet Lithography 2019 11147, 156-163, 2019 | 4 | 2019 |
| EUV mask defect material characterization through actinic lensless imaging T Shen, D Kazazis, HS Kim, A Dejkameh, R Nebling, Y Ekinci, I Mochi Metrology, Inspection, and Process Control XXXVI 12053, 151-158, 2022 | 1 | 2022 |
| A priori information in ptychographic image reconstruction for EUV mask metrology R Nebling, I Mochi, HS Kim, A Dejkameh, T Shen, Y Ekinci Computational Optics 2021 11875, 88-95, 2021 | 1 | 2021 |
| Lensless EUV mask inspection for anamorphic patterns I Mochi, HS Kim, A Dejkameh, R Nebling, D Kazazis, U Locans, T Shen, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 34-39, 2021 | 1 | 2021 |
| Fourier ptychography for lithography high NA systems A Dejkameh, A Erdmann, P Evanschitzky, Y Ekinci Computational Optics II 10694, 58-67, 2018 | 1 | 2018 |
| Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration A Dejkameh, R Nebling, U Locans, HS Kim, I Mochi, Y Ekinci Ultramicroscopy 258, 113912, 2024 | | 2024 |
| Recovery of missing frequency information in coherent diffraction imaging A Dejkameh ETH Zurich, 2024 | | 2024 |
| Photon flux dependent image resolution of reflective ptychographic microscope for extreme ultraviolet actinic mask metrology HS Kim, R Nebling, A Dejkameh, T Shen, Y Ekinci, I Mochi Journal of Micro/Nanopatterning, Materials, and Metrology 21 (3), 034002-034002, 2022 | | 2022 |
| Resolution limit and photon flux dependency in EUV ptychography H Kim, R Nebling, A Dejkameh, S Tao, I Mochi, Y Ekinci Photomask Technology 2021 11855, 19-26, 2021 | | 2021 |
| Missing frequency recovery through ptychography A Dejkameh, I Mochi, R Nebling, H Kim, T Shen, Y Ekinci Computational Optics 2021 11875, 118750J, 2021 | | 2021 |
| Ptychographic image reconstruction using total variation regularization R Nebling, I Mochi, H Kim, A Dejkameh, T Shen, M Guizar-Sicairos, ... Acta Crystallographica Section A: Foundations and Advances 77, C924-C924, 2021 | | 2021 |
| Photomask H Kim, U Locans, R Nebling, A Dejkameh, D Kazazis, Y Ekinci, I Mochi | | 2021 |
| Photomask R Nebling, H Kim, U Locans, A Dejkameh, Y Ekinci, I Mochi | | 2021 |
| Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging R Nebling, H Kim, U Locans, A Dejkameh, Y Ekinci, I Mochi Extreme Ultraviolet Lithography 2020 11517, 61-66, 2020 | | 2020 |
