| Extraordinary Photoresponse in Two-Dimensional In2Se3 Nanosheets RB Jacobs-Gedrim, M Shanmugam, N Jain, CA Durcan, MT Murphy, ... ACS nano 8 (1), 514-521, 2014 | 415 | 2014 |
| High-sensitivity molecular organometallic resist for EUV (MORE) J Passarelli, M Murphy, R Del Re, M Sortland, L Dousharm, ... Advances in Patterning Materials and Processes XXXII 9425, 233-245, 2015 | 64 | 2015 |
| Platinum and palladium oxalates: positive-tone extreme ultraviolet resists M Sortland, J Hotalen, RD Re, J Passarelli, M Murphy, TS Kulmala, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 043511-043511, 2015 | 45 | 2015 |
| Organometallic carboxylate resists for extreme ultraviolet with high sensitivity J Passarelli, M Murphy, RD Re, M Sortland, J Hotalen, L Dousharm, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 043503-043503, 2015 | 41 | 2015 |
| Reversible phase-change behavior in two-dimensional antimony telluride (Sb2Te3) nanosheets RB Jacobs-Gedrim, MT Murphy, F Yang, N Jain, M Shanmugam, ES Song, ... Applied Physics Letters 112 (13), 2018 | 24 | 2018 |
| Reactivity of metal-oxalate EUV resists as a function of the central metal S Grzeskowiak, A Narasimhan, M Murphy, L Napolitano, DA Freedman, ... Advances in Patterning Materials and Processes XXXIV 10146, 14-24, 2017 | 22 | 2017 |
| Polymer effects on PAG acid yield in EUV resists S Grzeskowiak, J Kaminsky, S Gibbons, M Murphy, J Chandonait, ... Advances in Patterning Materials and Processes XXXV 10586, 27-33, 2018 | 20 | 2018 |
| Analytical techniques for mechanistic characterization of EUV photoresists S Grzeskowiak, A Narasimhan, M Murphy, C Ackerman, J Kaminsky, ... Advances in Patterning Materials and Processes XXXIV 10146, 469-481, 2017 | 18 | 2017 |
| Advanced development techniques for metal-based EUV resists J Hotalen, M Murphy, W Earley, M Vockenhuber, Y Ekinci, DA Freedman, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 17-28, 2017 | 17 | 2017 |
| Scalable synthesis of two-dimensional antimony telluride nanoplates down to a single quintuple layer F Yang, RB Jacobs-Gedrim, M Shanmugam, N Jain, MT Murphy, ES Song, ... RSC Advances 5 (73), 59320-59325, 2015 | 13 | 2015 |
| First-row transitional-metal oxalate resists for EUV M Wilklow-Marnell, D Moglia, B Steimle, B Cardineau, H Al-Mashat, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 043507-043507, 2018 | 12 | 2018 |
| EUV mechanistic studies of antimony resists M Murphy, A Narasimhan, S Grzeskowiak, J Sitterly, P Schuler, J Richards, ... Journal of Photopolymer Science and Technology 30 (1), 121-131, 2017 | 12 | 2017 |
| Antimony photoresists for EUV lithography: mechanistic studies M Murphy, A Narasimhan, S Grzeskowiak, J Sitterly, P Schuler, J Richards, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 11-22, 2017 | 12 | 2017 |
| Electrical conduction and reliability in dual-layered graphene heterostructure interconnects N Jain, M Murphy, R Jacobs-Gedrim, M Shanmugam, F Yang, E Sang, ... IEEE Electron Device Letters 35 (12), 1311-1313, 2014 | 9 | 2014 |
| ACS Nano 8, 514 (2014) RB Jacobs-Gedrim, M Shanmugam, N Jain, CA Durcan, MT Murphy, ... DOI, 0 | 7 | |
| Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn) J Sitterly, M Murphy, S Grzeskowiak, G Denbeaux, RL Brainard Advances in Patterning Materials and Processes XXXV 10586, 234-240, 2018 | 5 | 2018 |
| Oligomers of MORE: Molecular organometallic resists for EUV S Hasan, M Murphy, M Weires, S Grzeskowiak, G Denbeaux, RL Brainard Advances in Patterning Materials and Processes XXXVI 10960, 205-213, 2019 | 3 | 2019 |
| Isotopic labeling studies of EUV photoresists containing antimony M Murphy, J Sitterly, S Grzeskowiak, G Denbeaux, RL Brainard Journal of Photopolymer Science and Technology 31 (2), 233-242, 2018 | 3 | 2018 |
| A molecular inorganic approach to EUV photoresists M Marnell, D Moglia, B Steimle, B Cardineau, H Al-Mashat, P Nastasi, ... SPIE advanced lithography conference, 2014 | 3 | 2014 |
| ToF-SIMS analysis of antimony carboxylate EUV photoresists M Murphy, S Hasan, S Novak, G Denbeaux, RL Brainard Advances in Patterning Materials and Processes XXXVI 10960, 108-116, 2019 | 2 | 2019 |
Greg DenbeauxSUNY Albany, College of Nanotechnology, Science, and EngineeringVerified email at albany.edu
