Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths N Mojarad, D Fan, J Gobrecht, Y Ekinci Optics Letters 39 (8), 2286-2289, 2014 | 40 | 2014 |
SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci Microelectronic Engineering 155, 44-49, 2016 | 33 | 2016 |
Effect of the pn junction engineering on Si microwire‐array solar cells A Dalmau Mallorquí, FM Epple, D Fan, O Demichel, ... physica status solidi (a) 209 (8), 1588-1591, 2012 | 31 | 2012 |
Nickel electroplating for high-resolution nanostructures K Hili, D Fan, VA Guzenko, Y Ekinci Microelectronic Engineering 141, 122-128, 2015 | 27 | 2015 |
Strain and thermal conductivity in ultrathin suspended silicon nanowires D Fan, H Sigg, R Spolenak, Y Ekinci Physical Review B 96 (11), 115307, 2017 | 23 | 2017 |
Photolithography reaches 6 nm half-pitch using EUV light D Fan, Y Ekinci Extreme Ultraviolet (EUV) LIthography VII 9776, 97761V, 2016 | 19 | 2016 |
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility D Fan, E Buitrago, S Yang, W Karim, Y Wu, R Tai, Y Ekinci Microelectronic Engineering 155, 55-60, 2016 | 18 | 2016 |
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light D Fan, Y Ekinci Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033505, 2016 | 17 | 2016 |
Engineered 3D polymer and hydrogel microenvironments for cell culture applications D Fan, U Staufer, A Accardo Bioengineering 6 (4), 113, 2019 | 16 | 2019 |
EUV resists towards 11nm half-pitch Y Ekinci, M Vockenhuber, N Mojarad, D Fan Extreme Ultraviolet (EUV) Lithography V 9048, 904804, 2014 | 14 | 2014 |
Nanolithography using Bessel beams of extreme ultraviolet wavelength D Fan, L Wang, Y Ekinci Scientific reports 6 (1), 1-8, 2016 | 13 | 2016 |
Fabrication of ultrahigh resolution metal nanowires and nanodots through EUV interference lithography J Huang, D Fan, Y Ekinci, C Padeste Microelectronic Engineering 141, 32-36, 2015 | 12 | 2015 |
All-dielectric metasurface-based roll-angle sensor X Chen, Z Tao, C Chen, C Wang, L Wang, H Jiang, D Fan, Y Ekinci, S Liu Sensors and Actuators A: Physical 279, 509-517, 2018 | 9 | 2018 |
Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing L Wang, D Fan, VA Guzenko, Y Ekinci Journal of Vacuum Science & Technology B, Nanotechnology and …, 2013 | 7 | 2013 |
Evidence for carbon clusters present near thermal gate oxides affecting the electronic band structure in SiC-MOSFET D Dutta, DS De, D Fan, S Roy, G Alfieri, M Camarda, M Amsler, ... Applied Physics Letters 115 (10), 101601, 2019 | 6 | 2019 |
3d printing of large areas of highly ordered submicron patterns for modulating cell behavior M Nouri-Goushki, MJ Mirzaali, L Angeloni, D Fan, M Minneboo, ... ACS applied materials & interfaces 12 (1), 200-208, 2019 | 5 | 2019 |
From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer … E Buitrago, R Fallica, D Fan, W Karim, M Vockenhuber, JA van Bokhoven, ... UV and Higher Energy Photonics: From Materials to Applications 9926, 99260T, 2016 | 4 | 2016 |
Ultra-dense silicon nanowires using extreme ultraviolet interference lithography D Fan, H Sigg, J Gobrecht, Y Ekinci, R Spolenak 2014 International Conference on Manipulation, Manufacturing and Measurement …, 2014 | 2 | 2014 |
Extreme‐UV interference lithography at the Paul Scherrer Institute E Buitrago, R Fallica, D Fan, W Karim, M Vockenhuber, J van Bokhoven, ... SPIE Newsroom, 2016 | 1 | 2016 |
Design of Optical Micromachines for Use in Biologically Relevant Environments* PK Andrew, D Fan, A Raudsepp, M Lofroth, U Staufer, MAK Williams, ... 2020 IEEE/ASME International Conference on Advanced Intelligent Mechatronics …, 2020 | | 2020 |