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Antoine Legrain
Antoine Legrain
Postdoctoral fellow, LTM, CNRS, Grenoble
Verifierad e-postadress på cea.fr
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Ultrafast Assembly of PS‐PDMS Block Copolymers on 300 mm Wafers by Blending with Plasticizers
J Arias‐Zapata, S Böhme, J Garnier, C Girardot, A Legrain, M Zelsmann
Advanced Functional Materials 26 (31), 5690-5700, 2016
302016
Controllable elastocapillary folding of three-dimensional micro-objects by through-wafer filling
A Legrain, TG Janson, JW Berenschot, L Abelmann, NR Tas
Journal of Applied Physics 115 (21), 2014
262014
Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line–Space Patterning
A Legrain, G Fleury, M Mumtaz, C Navarro, J Arias-Zapata, X Chevalier, ...
ACS applied materials & interfaces 9 (49), 43043-43050, 2017
222017
Engineering self-assembly of a high-χ block copolymer for large-area fabrication of transistors based on functional graphene nanoribbon arrays
J Arias-Zapata, JD Garnier, HA Mehedi, A Legrain, B Salem, G Cunge, ...
Chemistry of Materials 31 (9), 3154-3162, 2019
182019
Capillary origami of micro-machined micro-objects: Bi-layer conductive hinges
A Legrain, JW Berenschot, NR Tas, L Abelmann
Microelectronic engineering 140, 60-66, 2015
132015
Let's twist again: elasto-capillary assembly of parallel ribbons
A Legrain, EJW Berenschot, L Abelmann, J Bico, NR Tas
Soft matter 12 (34), 7186-7194, 2016
112016
Recent Achievements in sub-10 nm DSA lithography for Line/Space patterning
C Navarro, C Nicolet, F Ariura, X Chevalier, K Xu, MA Hockey, M Mumtaz, ...
Journal of Photopolymer Science and Technology 30 (1), 69-75, 2017
62017
Micro-assembly of three dimensional tetrahedra by capillary forces
JW van Honschoten, A Legrain, JW Berenschot, L Abelmann, NR Tas
2011 IEEE 24th International Conference on Micro Electro Mechanical Systems …, 2011
62011
Annealing treatments of cylindrical siloxane-based block copolymers optimized for nanomanufacturing
S Böhme, J Arias-Zapata, J Garnier, C Girardot, A Legrain, M Zelsmann
Micro and Nano Engineering 1, 56-62, 2018
42018
Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers
P Bézard, X Chevalier, A Legrain, C Navarro, C Nicolet, G Fleury, ...
Advanced Etch Technology for Nanopatterning VII 10589, 39-48, 2018
32018
Elasto-Capillary Folding Using Stop-Programmable Hinges Fabricated by 3D Micro-Machining
A Legrain, EJW Berenschot, NR Tas, L Abelmann
Plos one 10 (5), e0125891, 2015
32015
Elastocapillary folding of three dimensional micro-structures using water pumped through the wafer via a silicon nitride tube
ABH Legrain, JW Berenschot, RGP Sanders, K Ma, NR Tas, L Abelmann
22nd Micromechanics and Microsystems Europe Workshop, MME 2011, 250-253, 2011
12011
Micro and Nano Engineering
S Böhme, J Arias-Zapata, J Garnier, C Girardot, A Legrain, M Zelsmann
2018
Graphoepitaxy integration and pattern transfer of lamellar silicon-containing high-chi block copolymers
M Zelsmann, P Bézard, X Chevalier, A Legrain, C Navarro, C Nicolet, ...
SPIE Advanced Lithography 105890, 2018
2018
Block-copolymers performances improvement and design for DSA applications in microelectronic
X Chevalier, C Nicolet, G Fleury, M Zelsmann, P Bezard, A Legrain, ...
European Materials Research Society conference-E-MRS 2018, Spring Meeting, 2018
2018
Different approaches to reduce DSA defectivity by dry-etching
P Bézard, G Cunge, X Chevalier, G Lombard, A Legrain, M Zelsmann
Plasma Etch and Strip for Microtechnology workshop–PESM 2017, 2017
2017
Materials meeting electronic requirements for Sub-10 nm lithography
C Navarro, C Nicolet, X Chevalier, K Xu, MA Hockey, G Fleury, ...
Directed Self-Assembly Symposium–DSA 2017, 2017
2017
Interface optimization for high-chi block copolymers materials with sub-10 nm resolution
A Paquet, X Chevalier, A Legrain, M Zelsmann, G Fleury, C Nicolet, ...
Micro-and Nano-Engineering conference-MNE 2017, 2017
2017
Novel Si-containing high-χ block-copolymer for nanolithography application: PS-b-PDMSB
A Legrain, J Arias-Zapata, S Böhme, C Girardot, C Navarro, G Fleury, ...
Micro-and Nano-Engineering conference-MNE 2016, 2016
2016
Si-containing high- block-copolymers for nanolithography applications
A Legrain, C Girardot, X Chevalier, C Navarro, I Cayrefourcq, G Fleury, ...
Directed Self-Assembly Symposium–DSA 2016, 2016
2016
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Artiklar 1–20