| Frequency variation under constant power conditions in hydrogen radio frequency discharges E Amanatides, D Mataras Journal of Applied Physics 89 (3), 1556-1566, 2001 | 100 | 2001 |
| Gas phase and surface kinetics in plasma enhanced chemical vapor deposition of microcrystalline silicon: The combined effect of rf power and hydrogen dilution E Amanatides, S Stamou, D Mataras Journal of Applied Physics 90 (11), 5786-5798, 2001 | 82 | 2001 |
| High pressure regime of plasma enhanced deposition of microcrystalline silicon E Amanatides, A Hammad, E Katsia, D Mataras Journal of applied physics 97 (7), 2005 | 75 | 2005 |
| Improved surface energy analysis for plasma treated PET films D Papakonstantinou, E Amanatides, D Mataras, V Ioannidis, ... Plasma Processes and Polymers 4 (S1), S1057-S1062, 2007 | 72 | 2007 |
| Staphylococcus epidermidis adhesion to He, He/O2 plasma treated PET films and aged materials: Contributions of surface free energy and shear rate M Katsikogianni, E Amanatides, D Mataras, YF Missirlis Colloids and Surfaces B: Biointerfaces 65 (2), 257-268, 2008 | 63 | 2008 |
| Effect of frequency in the deposition of microcrystalline silicon from silane discharges E Amanatides, D Mataras, DE Rapakoulias Journal of Applied Physics 90 (11), 5799-5807, 2001 | 53 | 2001 |
| Plasma surface treatment of polyethylene terephthalate films for bacterial repellence E Amanatides, D Mataras, M Katsikogianni, YF Missirlis Surface and Coatings Technology 200 (22-23), 6331-6335, 2006 | 49 | 2006 |
| Covalent immobilization of liposomes on plasma functionalized metallic surfaces S Mourtas, M Kastellorizios, P Klepetsanis, E Farsari, E Amanatides, ... Colloids and Surfaces B: Biointerfaces 84 (1), 214-220, 2011 | 42 | 2011 |
| RF power effect on TEOS/O2 PECVD of silicon oxide thin films C Voulgaris, A Panou, E Amanatides, D Mataras Surface and Coatings Technology 200 (1-4), 351-354, 2005 | 37 | 2005 |
| Deposition rate optimization in SiH4/H2 PECVD of hydrogenated microcrystalline silicon E Amanatides, D Mataras, DE Rapakoulias Thin Solid Films 383 (1-2), 15-18, 2001 | 36 | 2001 |
| Glancing Angle Deposition Effect on Structure and Light-Induced Wettability of RF-Sputtered TiO2 Thin Films VE Vrakatseli, AN Kalarakis, AG Kalampounias, EK Amanatides, ... Micromachines 9 (8), 389, 2018 | 35 | 2018 |
| Plasma emission diagnostics for the transition from microcrystalline to amorphous silicon solar cells E Amanatides, D Mataras, D Rapakoulias, MN Van den Donker, B Rech Solar energy materials and solar cells 87 (1-4), 795-805, 2005 | 30 | 2005 |
| RF power and SiOxCyHz deposition efficiency in TEOS/O2 discharges for the corrosion protection of magnesium alloys C Voulgaris, E Amanatides, D Mataras, S Grassini, E Angelini, ... Surface and Coatings Technology 200 (22-23), 6618-6622, 2006 | 27 | 2006 |
| Total SiH4/H2 pressure effect on microcrystalline silicon thin films growth and structure E Katsia, E Amanatides, D Mataras, Α Soto, GA Voyiatzis Solar energy materials and solar cells 87 (1-4), 157-167, 2005 | 25 | 2005 |
| A hybrid kinetic Monte Carlo method for simulating silicon films grown by plasma-enhanced chemical vapor deposition DG Tsalikis, C Baig, VG Mavrantzas, E Amanatides, D Mataras The Journal of Chemical Physics 139 (20), 2013 | 24 | 2013 |
| Combined effect of electrode gap and radio frequency on power deposition and film growth kinetics in discharges E Amanatides, D Mataras, DE Rapakoulias Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (1 …, 2002 | 20 | 2002 |
| Effect of substrate bias on the plasma enhanced chemical vapor deposition of microcrystalline silicon thin films XD Zhang, FR Zhang, E Amanatides, D Mataras, Y Zhao Thin Solid Films 516 (20), 6912-6918, 2008 | 18 | 2008 |
| Plasma Treated and a‐C: H Coated PET Performance in Inhibiting Bacterial Adhesion MG Katsikogianni, CS Syndrevelis, EK Amanatides, DS Mataras, ... Plasma processes and polymers 4 (S1), S1046-S1051, 2007 | 18 | 2007 |
| Simulation of the electrical properties of SiH4/H2 RF discharges B Lyka, E Amanatides, D Mataras Japanese journal of applied physics 45 (10S), 8172, 2006 | 18 | 2006 |
| PECVD of hydrogenated silicon thin films from SiH4+ H2+ Si2H6 mixtures A Hammad, E Amanatides, D Mataras, D Rapakoulias Thin Solid Films 451, 255-258, 2004 | 18 | 2004 |
