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Tao Yu
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A new self-aligned quantum-well MOSFET architecture fabricated by a scalable tight-pitch process
J Lin, X Zhao, T Yu, DA Antoniadis, JA Del Alamo
2013 IEEE International Electron Devices Meeting, 16.2. 1-16.2. 4, 2013
722013
Investigation on variability in metal-gate Si nanowire MOSFETs: Analysis of variation sources and experimental characterization
R Wang, J Zhuge, R Huang, T Yu, J Zou, DW Kim, D Park, Y Wang
IEEE transactions on electron devices 58 (8), 2317-2325, 2011
642011
Investigations on line-edge roughness (LER) and line-width roughness (LWR) in nanoscale CMOS technology: Part II–experimental results and impacts on device variability
R Wang, X Jiang, T Yu, J Fan, J Chen, DZ Pan, R Huang
IEEE transactions on electron devices 60 (11), 3676-3682, 2013
612013
Investigations on line-edge roughness (LER) and line-width roughness (LWR) in nanoscale CMOS technology: Part I–modeling and simulation method
X Jiang, R Wang, T Yu, J Chen, R Huang
IEEE Transactions on electron devices 60 (11), 3669-3675, 2013
432013
In0. 53Ga0. 47As/GaAs0. 5Sb0. 5 Quantum-Well Tunnel-FETs With Tunable Backward Diode Characteristics
T Yu, JT Teherani, DA Antoniadis, JL Hoyt
Electron Device Letters, IEEE 34 (12), 1503-1505, 2013
37*2013
Investigation of nanowire line-edge roughness in gate-all-around silicon nanowire MOSFETs
T Yu, R Wang, R Huang, J Chen, J Zhuge, Y Wang
IEEE transactions on electron devices 57 (11), 2864-2871, 2010
362010
Reducing power consumption for time-of-flight depth imaging
C Mathy, S Demirtas, B Huo, D Gajaria, JA Goldberg, N Le Dortz, T Yu, ...
US Patent 10,841,491, 2020
352020
High mobility high-κ-all-around asymmetrically-strained germanium nanowire trigate p-MOSFETs
W Chern, P Hashemi, JT Teherani, T Yu, Y Dong, G Xia, DA Antoniadis, ...
2012 International Electron Devices Meeting, 16.5. 1-16.5. 4, 2012
322012
Characterization and analysis of gate-all-around Si nanowire transistors for extreme scaling
R Huang, R Wang, J Zhuge, C Liu, T Yu, L Zhang, X Huang, Y Ai, J Zou, ...
2011 IEEE Custom Integrated Circuits Conference (CICC), 1-8, 2011
302011
Radio frequency ranging using phase difference
T Yu
US Patent 10,469,184, 2019
182019
Impacts of short-channel effects on the random threshold voltage variation in nanoscale transistors
RS Wang, T Yu, R Huang, YY Wang
Science China Information Sciences 56, 1-7, 2013
182013
Linewidth roughness in nanowire-mask-based graphene nanoribbons
G Xu, CM Torres, J Bai, J Tang, T Yu, Y Huang, X Duan, Y Zhang, ...
Applied Physics Letters 98 (24), 2011
172011
Quantifying the impact of gate efficiency on switching steepness of quantum-well tunnel-fets: Experiments, modeling, and design guidelines
T Yu, U Radhakrishna, JL Hoyt, DA Antoniadis
2015 IEEE International Electron Devices Meeting (IEDM), 22.4. 1-22.4. 4, 2015
152015
Negative-bias temperature instability in gate-all-around silicon nanowire MOSFETs: Characteristic modeling and the impact on circuit aging
C Liu, T Yu, R Wang, L Zhang, R Huang, DW Kim, D Park, Y Wang
IEEE transactions on electron devices 57 (12), 3442-3450, 2010
152010
Electrostatic design of vertical tunneling field-effect transistors
JT Teherani, T Yu, DA Antoniadis, JL Hoyt
2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S), 1-2, 2013
122013
Microwave detection performance of In0.53Ga0.47As/GaAs0.5Sb0.5 quantum‐well tunnel field‐effect transistors
W Li, P Fay, T Yu, J Hoyt
Electronics Letters 52 (10), 842-844, 2016
92016
Effects of substrate leakage and drain-side thermal barriers in In0. 53Ga0. 47As/GaAs0. 5Sb0. 5 quantum-well tunneling field-effect transistors
T Yu, JT Teherani, DA Antoniadis, JL Hoyt
Applied Physics Express 7 (9), 094201, 2014
82014
New observations of suppressed randomization in LER/LWR of Si nanowire transistors: Experiments and mechanism analysis
R Wang, T Yu, R Huang, Y Ai, S Pu, Z Hao, J Zhuge, Y Wang
2010 International Electron Devices Meeting, 34.6. 1-34.6. 4, 2010
62010
Tunneling FET fabrication and characterization
T Yu, JL Hoyt, DA Antoniadis
Tunneling Field Effect Transistor Technology, 33-60, 2016
42016
Self-heating effect and characteristic variability of gate-all-around silicon nanowire transistors for highly-scaled CMOS technology
R Huang, RS Wang, J Zhuge, T Yu, YJ Ai, C Fan, SS Pu, JB Zou, ...
2010 IEEE International SOI Conference (SOI), 1-4, 2010
42010
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