Robert J. Rafac
Robert J. Rafac
MTS Scientist, ASML-US
Verified email at asml.com
Title
Cited by
Cited by
Year
Sub-dekahertz Ultraviolet Spectroscopy of
RJ Rafac, BC Young, JA Beall, WM Itano, DJ Wineland, JC Bergquist
Physical Review Letters 85 (12), 2462, 2000
4052000
Optical frequency standards and measurements
L Hollberg, CW Oates, EA Curtis, EN Ivanov, SA Diddams, T Udem, ...
IEEE Journal of Quantum Electronics 37 (12), 1502-1513, 2001
1622001
Fast-beam laser lifetime measurements of the cesium states
RJ Rafac, CE Tanner, AE Livingston, HG Berry
Physical Review A 60 (5), 3648, 1999
1161999
Stable configurations of confined cold ionic systems
R Rafac, JP Schiffer, JS Hangst, DH Dubin, DJ Wales
Proceedings of the National Academy of Sciences 88 (2), 483-486, 1991
1041991
Precision lifetime measurements of the 6 states in atomic cesium
RJ Rafac, CE Tanner, AE Livingston, KW Kukla, HG Berry, CA Kurtz
Physical Review A 50 (3), R1976, 1994
941994
Measurement of the ratio of the cesium -line transition strengths
RJ Rafac, CE Tanner
Physical Review A 58 (2), 1087, 1998
721998
Measurement of the 6 state lifetime in atomic cesium
CE Tanner, AE Livingston, RJ Rafac, FG Serpa, KW Kukla, HG Berry, ...
Physical review letters 69 (19), 2765, 1992
581992
Direct comparison of two cold-atom-based optical frequency standards by using a femtosecond-laser comb
KR Vogel, SA Diddams, CW Oates, EA Curtis, RJ Rafac, WM Itano, ...
Optics letters 26 (2), 102-104, 2001
502001
Measurement of the state hyperfine structure
RJ Rafac, CE Tanner
Physical Review A 56 (1), 1027, 1997
481997
LPP EUV source readiness for NXE 3300B
DC Brandt, IV Fomenkov, NR Farrar, B La Fontaine, DW Myers, DJ Brown, ...
Extreme Ultraviolet (EUV) Lithography V 9048, 90480C, 2014
342014
Laser pulse shaping via extremum seeking
B Ren, P Frihauf, RJ Rafac, M Krstic
Control Engineering Practice 20 (7), 674-683, 2012
322012
Effects of laser bandwidth on OPE in a modern lithography tool
K Huggins, T Tsuyoshi, M Ong, R Rafac, C Treadway, D Choudhary, ...
Optical Microlithography XIX 6154, 61540Z, 2006
302006
Method and apparatus for gas discharge laser output light coherency reduction
R Rafac, S Smith
US Patent App. 10/881,533, 2005
272005
Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography
VB Fleurov, DJ Colon III, DJW Brown, P O'Keeffe, H Besaucele, AI Ershov, ...
Optical Microlithography XVI 5040, 1694-1703, 2003
262003
Hg+ optical frequency standard: recent progress
B Young, RJ Rafac, JA Beall, JE Cruz, WM Itano, DJ Wineland, ...
232000
Relax gas discharge laser lithography light source
RL Sandstrom, WN Partlo, DJW Brown, TA Yager, AI Ershov, RJ Rafac, ...
US Patent 7,088,758, 2006
212006
Overcoming limitations of etalon spectrometers used for spectral metrology of DUV excimer light sources
RJ Rafac
Optical Microlithography XVII 5377, 846-858, 2004
202004
Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W
M Purvis, IV Fomenkov, AA Schafgans, M Vargas, S Rich, Y Tao, ...
Extreme Ultraviolet (EUV) Lithography IX 10583, 1058327, 2018
192018
Extreme ultraviolet light source
RJ Rafac, RL Sandstrom, D Brown, KC Hou
US Patent 9,232,623, 2016
192016
Laser produced plasma EUV sources for device development and HVM
DC Brandt, IV Fomenkov, MJ Lercel, BM La Fontaine, DW Myers, ...
Extreme Ultraviolet (EUV) Lithography III 8322, 83221I, 2012
192012
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