Robert J. Rafac
Robert J. Rafac
MTS Scientist, ASML-US
Verified email at
Cited by
Cited by
Sub-dekahertz Ultraviolet Spectroscopy of
RJ Rafac, BC Young, JA Beall, WM Itano, DJ Wineland, JC Bergquist
Physical Review Letters 85 (12), 2462, 2000
Optical frequency standards and measurements
L Hollberg, CW Oates, EA Curtis, EN Ivanov, SA Diddams, T Udem, ...
IEEE Journal of Quantum Electronics 37 (12), 1502-1513, 2001
Fast-beam laser lifetime measurements of the cesium states
RJ Rafac, CE Tanner, AE Livingston, HG Berry
Physical Review A 60 (5), 3648, 1999
Stable configurations of confined cold ionic systems
R Rafac, JP Schiffer, JS Hangst, DH Dubin, DJ Wales
Proceedings of the National Academy of Sciences 88 (2), 483-486, 1991
Precision lifetime measurements of the 6 states in atomic cesium
RJ Rafac, CE Tanner, AE Livingston, KW Kukla, HG Berry, CA Kurtz
Physical Review A 50 (3), R1976, 1994
Measurement of the ratio of the cesium -line transition strengths
RJ Rafac, CE Tanner
Physical Review A 58 (2), 1087, 1998
Measurement of the 6 state lifetime in atomic cesium
CE Tanner, AE Livingston, RJ Rafac, FG Serpa, KW Kukla, HG Berry, ...
Physical review letters 69 (19), 2765, 1992
Direct comparison of two cold-atom-based optical frequency standards by using a femtosecond-laser comb
KR Vogel, SA Diddams, CW Oates, EA Curtis, RJ Rafac, WM Itano, ...
Optics letters 26 (2), 102-104, 2001
Measurement of the state hyperfine structure
RJ Rafac, CE Tanner
Physical Review A 56 (1), 1027, 1997
LPP EUV source readiness for NXE 3300B
DC Brandt, IV Fomenkov, NR Farrar, B La Fontaine, DW Myers, DJ Brown, ...
Extreme Ultraviolet (EUV) Lithography V 9048, 90480C, 2014
Laser pulse shaping via extremum seeking
B Ren, P Frihauf, RJ Rafac, M Krstic
Control Engineering Practice 20 (7), 674-683, 2012
Effects of laser bandwidth on OPE in a modern lithography tool
K Huggins, T Tsuyoshi, M Ong, R Rafac, C Treadway, D Choudhary, ...
Optical Microlithography XIX 6154, 61540Z, 2006
Method and apparatus for gas discharge laser output light coherency reduction
R Rafac, S Smith
US Patent App. 10/881,533, 2005
Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography
VB Fleurov, DJ Colon III, DJW Brown, P O'Keeffe, H Besaucele, AI Ershov, ...
Optical Microlithography XVI 5040, 1694-1703, 2003
Hg+ optical frequency standard: recent progress
B Young, RJ Rafac, JA Beall, JE Cruz, WM Itano, DJ Wineland, ...
Relax gas discharge laser lithography light source
RL Sandstrom, WN Partlo, DJW Brown, TA Yager, AI Ershov, RJ Rafac, ...
US Patent 7,088,758, 2006
Overcoming limitations of etalon spectrometers used for spectral metrology of DUV excimer light sources
RJ Rafac
Optical Microlithography XVII 5377, 846-858, 2004
Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W
M Purvis, IV Fomenkov, AA Schafgans, M Vargas, S Rich, Y Tao, ...
Extreme Ultraviolet (EUV) Lithography IX 10583, 1058327, 2018
Extreme ultraviolet light source
RJ Rafac, RL Sandstrom, D Brown, KC Hou
US Patent 9,232,623, 2016
Laser produced plasma EUV sources for device development and HVM
DC Brandt, IV Fomenkov, MJ Lercel, BM La Fontaine, DW Myers, ...
Extreme Ultraviolet (EUV) Lithography III 8322, 83221I, 2012
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