| Sub-dekahertz Ultraviolet Spectroscopy of RJ Rafac, BC Young, JA Beall, WM Itano, DJ Wineland, JC Bergquist Physical Review Letters 85 (12), 2462, 2000 | 405 | 2000 |
| Optical frequency standards and measurements L Hollberg, CW Oates, EA Curtis, EN Ivanov, SA Diddams, T Udem, ... IEEE Journal of Quantum Electronics 37 (12), 1502-1513, 2001 | 162 | 2001 |
| Fast-beam laser lifetime measurements of the cesium states RJ Rafac, CE Tanner, AE Livingston, HG Berry Physical Review A 60 (5), 3648, 1999 | 116 | 1999 |
| Stable configurations of confined cold ionic systems R Rafac, JP Schiffer, JS Hangst, DH Dubin, DJ Wales Proceedings of the National Academy of Sciences 88 (2), 483-486, 1991 | 104 | 1991 |
| Precision lifetime measurements of the 6 states in atomic cesium RJ Rafac, CE Tanner, AE Livingston, KW Kukla, HG Berry, CA Kurtz Physical Review A 50 (3), R1976, 1994 | 94 | 1994 |
| Measurement of the ratio of the cesium -line transition strengths RJ Rafac, CE Tanner Physical Review A 58 (2), 1087, 1998 | 72 | 1998 |
| Measurement of the 6 state lifetime in atomic cesium CE Tanner, AE Livingston, RJ Rafac, FG Serpa, KW Kukla, HG Berry, ... Physical review letters 69 (19), 2765, 1992 | 58 | 1992 |
| Direct comparison of two cold-atom-based optical frequency standards by using a femtosecond-laser comb KR Vogel, SA Diddams, CW Oates, EA Curtis, RJ Rafac, WM Itano, ... Optics letters 26 (2), 102-104, 2001 | 50 | 2001 |
| Measurement of the state hyperfine structure RJ Rafac, CE Tanner Physical Review A 56 (1), 1027, 1997 | 48 | 1997 |
| LPP EUV source readiness for NXE 3300B DC Brandt, IV Fomenkov, NR Farrar, B La Fontaine, DW Myers, DJ Brown, ... Extreme Ultraviolet (EUV) Lithography V 9048, 90480C, 2014 | 34 | 2014 |
| Laser pulse shaping via extremum seeking B Ren, P Frihauf, RJ Rafac, M Krstic Control Engineering Practice 20 (7), 674-683, 2012 | 32 | 2012 |
| Effects of laser bandwidth on OPE in a modern lithography tool K Huggins, T Tsuyoshi, M Ong, R Rafac, C Treadway, D Choudhary, ... Optical Microlithography XIX 6154, 61540Z, 2006 | 30 | 2006 |
| Method and apparatus for gas discharge laser output light coherency reduction R Rafac, S Smith US Patent App. 10/881,533, 2005 | 27 | 2005 |
| Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography VB Fleurov, DJ Colon III, DJW Brown, P O'Keeffe, H Besaucele, AI Ershov, ... Optical Microlithography XVI 5040, 1694-1703, 2003 | 26 | 2003 |
| Hg+ optical frequency standard: recent progress B Young, RJ Rafac, JA Beall, JE Cruz, WM Itano, DJ Wineland, ... | 23 | 2000 |
| Relax gas discharge laser lithography light source RL Sandstrom, WN Partlo, DJW Brown, TA Yager, AI Ershov, RJ Rafac, ... US Patent 7,088,758, 2006 | 21 | 2006 |
| Overcoming limitations of etalon spectrometers used for spectral metrology of DUV excimer light sources RJ Rafac Optical Microlithography XVII 5377, 846-858, 2004 | 20 | 2004 |
| Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W M Purvis, IV Fomenkov, AA Schafgans, M Vargas, S Rich, Y Tao, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 1058327, 2018 | 19 | 2018 |
| Extreme ultraviolet light source RJ Rafac, RL Sandstrom, D Brown, KC Hou US Patent 9,232,623, 2016 | 19 | 2016 |
| Laser produced plasma EUV sources for device development and HVM DC Brandt, IV Fomenkov, MJ Lercel, BM La Fontaine, DW Myers, ... Extreme Ultraviolet (EUV) Lithography III 8322, 83221I, 2012 | 19 | 2012 |
