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Iftekhar Chowdhury
Iftekhar Chowdhury
Engineering Manager
Verified email at intel.com
Title
Cited by
Cited by
Year
High growth rate 4H-SiC epitaxial growth using dichlorosilane in a hot-wall CVD reactor
I Chowdhury, MVS Chandrasekhar, PB Klein, JD Caldwell, T Sudarshan
Journal of Crystal Growth 316 (1), 60-66, 2011
662011
High purity semi-insulating 4H-SiC epitaxial layers by defect-competition epitaxy: controlling Si vacancies
MVS Chandrashekhar, I Chowdhury, P Kaminski, R Kozlowski, PB Klein, ...
Applied Physics Express 5 (2), 025502, 2012
262012
Doping dependence of thermal oxidation on n-Type 4H-SiC
BK Daas, MM Islam, IA Chowdhury, F Zhao, TS Sudarshan, ...
IEEE transactions on electron devices 58 (1), 115-121, 2010
242010
Step dynamics in the homoepitaxial growth of 6H-SiC by chemical vapor deposition on 1 offcut substrate using dichlorosilane as Si precursor
SU Omar, MVS Chandrashekhar, IA Chowdhury, TA Rana, TS Sudarshan
Journal of Applied Physics 113 (18), 2013
102013
Graphene to graphane: Novel electrochemical conversion
KM Daniels, B Daas, R Zhang, I Chowdhury, A Obe, J Weidner, ...
arXiv preprint arXiv:1010.5458, 2010
62010
Journey towards E-governance: A Bangladesh perspective
IA Chowdhury, MS Islam, ZH Mahmood
Proceedings of 7th International Conference on Computer and Information …, 2004
52004
Step Controlled Epitaxy on 4 degree and 1 degree Off-Cut 4 H and 6 H-SiC Substrate Using Dichlorosilane
S Omar, H Song, I Chowdhury, MVS Chandrashekhar, T Sudarshan
Minerals, Metals and Materials Society/AIME, 420 Commonwealth Dr., P. O. Box …, 2011
2011
High growth rate and high purity semi-insulating epitaxy using dichlorosilane for power devices
I Chowdhury
University of South Carolina, 2010
2010
Recent Developments in SiC Homoepitaxy using Dichlorosilane for High Power Devices
I Chowdhury, MVS Chandrasekhar, PB Klein, JD Caldwell, T Sudarshan
MRS Online Proceedings Library (OPL) 1246, 1246-B04-06, 2010
2010
Solid-State Power and High Voltage Devices Simulation and Analysis of InGaAs Power MOSFET Performances and Reliability... JB Steighner, J.-S. Yuan, and Y. Liu 180 Materials …
E Harvard, R Brown, JR Shealy, DX Liu, HC Chin, LS Tan, YC Yeo, ...
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